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CORRECTION article

Front. Chem., 20 December 2022
Sec. Theoretical and Computational Chemistry
Volume 10 - 2022 | https://doi.org/10.3389/fchem.2022.1118819

Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water

This article is a correction to:

  1. Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water

    1. Read original article
Rui XuRui Xu1Zhongchao ZhouZhongchao Zhou1Jing LiJing Li1Xu ZhangXu Zhang1Yuanyuan ZhuYuanyuan Zhu1Hongping Xiao Hongping Xiao1*Lina Xu Lina Xu1*Yihong DingYihong Ding1Aidong LiAidong Li2Guoyong Fang Guoyong Fang1*
  • 1Key Laboratory of Carbon Materials of Zhejiang Province, College of Chemistry and Materials Engineering, Wenzhou University, Wenzhou, China
  • 2National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Nanjing University, Nanjing, China

A Corrigendum on
Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water

by Xu R, Zhou Z, Li J, Zhang X, Zhu Y, Xiao H, Xu L, Ding Y, Li A and Fang G (2022). Front. Chem. 10:1035902. doi: 10.3389/fchem.2022.1035902

In the original article, the Supplementary material contained “Data Sheet 1”, which was not intended for publication. The incorrect file has been unpublished, and the remaining file, previously “Data Sheet 2”, has been renamed as “Data Sheet 1”.

The authors apologize for this error and state that this does not change the scientific conclusions of the article in any way. The original article has been updated.

Publisher’s note

All claims expressed in this article are solely those of the authors and do not necessarily represent those of their affiliated organizations, or those of the publisher, the editors and the reviewers. Any product that may be evaluated in this article, or claim that may be made by its manufacturer, is not guaranteed or endorsed by the publisher.

Keywords: zirconium oxide, atomic layer deposition, reaction mechanism, tetrakis(dimethylamino)zirconium, density functional theory

Citation: Xu R, Zhou Z, Li J, Zhang X, Zhu Y, Xiao H, Xu L, Ding Y, Li A and Fang G (2022) Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water. Front. Chem. 10:1118819. doi: 10.3389/fchem.2022.1118819

Received: 08 December 2022; Accepted: 14 December 2022;
Published: 20 December 2022.

Edited and reviewed by:

Sudip Pan, Jilin University, China

Copyright © 2022 Xu, Zhou, Li, Zhang, Zhu, Xiao, Xu, Ding, Li and Fang. This is an open-access article distributed under the terms of the Creative Commons Attribution License (CC BY). The use, distribution or reproduction in other forums is permitted, provided the original author(s) and the copyright owner(s) are credited and that the original publication in this journal is cited, in accordance with accepted academic practice. No use, distribution or reproduction is permitted which does not comply with these terms.

*Correspondence: Hongping Xiao, hp_xiao@wzu.edu.cn; Lina Xu, xulina@wzu.edu.cn; Guoyong Fang, fanggy@wzu.edu.cn

Disclaimer: All claims expressed in this article are solely those of the authors and do not necessarily represent those of their affiliated organizations, or those of the publisher, the editors and the reviewers. Any product that may be evaluated in this article or claim that may be made by its manufacturer is not guaranteed or endorsed by the publisher.