AUTHOR=Huang Hao , Huang Meiling , Lv Wenyi , Hu Yong , Wang Ruihua , Zheng Xiufen , Ma Yuetang , Chen Chunmei , Tang Hongfeng 

TITLE=Inhibition of Trichophyton rubrum by 420-nm Intense Pulsed Light: In Vitro Activity and the Role of Nitric Oxide in Fungal Death

JOURNAL=Frontiers in Pharmacology

VOLUME=10

YEAR=2019

URL=https://www.frontiersin.org/journals/pharmacology/articles/10.3389/fphar.2019.01143

DOI=10.3389/fphar.2019.01143

ISSN=1663-9812

ABSTRACT=<p><italic>Trichophyton rubrum</italic> is a common dermatophyte of the skin. The aim of this experiment was to explore the role of nitric oxide (NO) in the inhibition of <italic>T. rubrum</italic> growth induced by 420-nm intense pulsed light (IPL). This study found that nitric oxide synthase (NOS) and NO levels were increased, whereas asymmetric dimethylarginine (ADMA) level, keratinase activity, and fungal viability were decreased after IPL treatment compared with the control condition <italic>in vitro</italic>. Moreover, micromorphology was damaged by IPL treatment. Fungal viability was increased, and the damage to the fungal structure was reduced after pretreatment with an NOS inhibitor (L-NMMA) compared with IPL treatment alone. Compared with IPL alone, pretreatment with L-NMMA decreased NOS expression and NO level and increased keratinase activity. We found that 420-nm IPL treatment can inhibit the growth of <italic>T. rubrum</italic> by regulating NO <italic>in vitro</italic>.</p>