AUTHOR=Asapu Shiva , Pagaduan James Nicolas , Zhuo Ye , Moon Taehwan , Midya Rivu , Gao Dawei , Lee Jungmin , Wu Qing , Barnell Mark , Ganguli Sabyasachi , Katsumata Reika , Chen Yong , Xia Qiangfei , Yang J. Joshua TITLE=Large remnant polarization and great reliability characteristics in W/HZO/W ferroelectric capacitors JOURNAL=Frontiers in Materials VOLUME=9 YEAR=2022 URL=https://www.frontiersin.org/journals/materials/articles/10.3389/fmats.2022.969188 DOI=10.3389/fmats.2022.969188 ISSN=2296-8016 ABSTRACT=

In this work, the effect of rapid thermal annealing (RTA) temperature on the ferroelectric polarization in zirconium-doped hafnium oxide (HZO) was studied. To maximize remnant polarization (2Pr), in-plane tensile stress was induced by tungsten electrodes under optimal RTA temperatures. We observed an increase in 2Pr with RTA temperature, likely due to an increased proportion of the polar ferroelectric phase in HZO. The HZO capacitors annealed at 400°C did not exhibit any ferroelectric behavior, whereas the HZO capacitors annealed at 800°C became highly leaky and shorted for voltages above 1 V. On the other hand, annealing at 700 °C produced HZO capacitors with a record-high 2Pr of ∼ 64 μC cm−2 at a relatively high frequency of 111 kHz. These ferroelectric capacitors have also demonstrated impressive endurance and retention characteristics, which will greatly benefit neuromorphic computing applications.